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Article · Plasma Physics Reports · June 1, 2008

Effect of the scheme of plasmachemical processes on the calculated characteristics of a barrier discharge in xenon

Svetlana V. Avtaeva, É. B. Kulumbaev

Svetlana Avtaeva
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Abstract

The dynamics of a repetitive barrier discharge in xenon at a pressure of 400 Torr is simulated using a one-dimensional drift-diffusion model. The thicknesses of identical barriers with a dielectric constant of 4 are 2 mm, and the gap length is 4 mm. The discharge is fed with an 8-kV ac voltage at a frequency of 25 or 50 kHz. The development of the ionization wave and the breakdown and afterglow phases of a barrier discharge are analyzed using two different kinetic schemes of elementary processes in a xenon plasma. It is shown that the calculated waveforms of the discharge voltage and current, the instant of breakdown, and the number of breakdowns per voltage half-period depend substantially on the properties of the kinetic scheme of plasmachemical processes.

Atmospheric-Pressure Plasma ApplicationsVacuum and Plasma ArcsLow-Pressure Plasma Processing and Diagnosticsdielectric barrier dischargexenon plasmakinetic scheme

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